Hitachi Chemical Founds the First Photosensitive Dry Film R&D Base in SIP

Hitachi Chemical (Suzhou) Co., Ltd. held a construction completion ceremony for its R&D Center in Suzhou Industrial Park (SIP) on May 19 and this is also the first photosensitive dry film R&D base established by Japanese company in China. The guests attending the ceremony include Deputy Mayor Qiu Lixin of Suzhou and Mr. Yang Zhiping, Deputy Director of SIP CPC Working Committee & Director of SIP Administrative Committee.

The unveiling ceremony for the R&D Center

   Planting a tree to remember the day

With a total investment of 520 million yen and a total construction area of 3,150 square meters, the R&D Center will focus on the development of new products to meet the needs of Chinese market and to improve the competitive strength of the company. The R&D facility located in the premises of Hitachi Chemical (Suzhou) Co., Ltd. will be used to develop photosensitive dry film for printed circuit card by introducing state-of-the-art assessment equipments and recruiting excellent local professionals. This is also the first photosensitive dry film R&D base established by Japanese company in China.

The exterior view of the R&D Center

The founding of the R&D Center will greatly enhance the development capacity and flexibility of Hitachi Chemical, which will help to shorten the development cycle in meeting the actual needs of Chinese market, to win more time to communicate with clients, and to further expand its presence and performance in China.

May 20, 2009